MPW & Mini@sic

Multi Project Wafer (MPW)

High costs of a prototype run can be shared among different customers by combining their designs into one mask set. This technique, known as Multi Project Wafer, reduces the cost of a full prototyping wafer run to 10% or even 5% of the initial price.

MPW Principle
MPW Principle

Mini@sic

The minimum charged design size on regular MPW runs can still be larger than most of the designs created for research purposes. Therefore, EUROPRACTICE introduced the mini@sic principle.

Several times per year, a minimum area of an MPW block is bought and resold in smaller sub-blocks – mini@sics. This solution offers lower prototype fabrication costs than General MPW runs.

 

Mini@sic options are available for the following technologies:

GLOBALFOUNDRIESselected MPW runs for 130nm, 55nm, 45nm and 22nm nodes
IHPall MPW runs
On Semiconductorall MPW runs, except On Semi 0,18 µm
TSMCselected MPW runs for 0.18µm, 65nm, 40nm and 28nm
UMCselected MPW runs for 0.18µm, 0.13µm and 65nm
X-FABselected MPW runs for XH018 and XT018

For more information, please check our latest MPW General and mini@sic run schedules and pricelists.

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