High costs of a prototype run can be shared among different customers by combining their designs into one mask set. This technique, known as Multi Project Wafer, reduces the cost of a full prototyping wafer run to 10% or even 5% of the initial price.
The minimum charged design size on regular MPW runs can still be larger than most of the designs created for research purposes. Therefore, EUROPRACTICE introduced the mini@sic principle.
Several times per year, a minimum area of an MPW block is bought and resold in smaller sub-blocks – mini@sics. This solution offers lower prototype fabrication costs than General MPW runs.
Mini@sic options are available for the following technologies:
|GLOBALFOUNDRIES||selected MPW runs for 130nm, 55nm, 45nm and 22nm nodes|
|IHP||all MPW runs|
|On Semiconductor||all MPW runs, except On Semi 0,18 µm|
|TSMC||selected MPW runs for 0.18µm, 65nm, 40nm and 28nm|
|UMC||selected MPW runs for 0.18µm, 0.13µm and 65nm|
|X-FAB||selected MPW runs for XH018 and XT018|
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