2D Experimental Pilot Line



The 2D Experimental Pilot Line (2D-EPL) has launched its first multi-project wafer (MPW) run where universities, research institutes and companies can include their designs as dies on joint wafers. The first run is mainly intended for graphene sensors, and will be offered by AMO GmbH

Why apply?
  • Customizable chips
  • Short turn around
  • Flexible process flows
  • Direct communication channels
  • Experienced partners
  • Feasibility consulting
About AMO

Located in Aachen, Germany, close to the borders of Belgium and the Netherlands, the research foundry AMO GmbH, a non-profit nanotechnology SME, follows the mission to efficiently close the gap between university research and industrial application. It demonstrates innovative technologies and introduces new materials, including their implementation in novel device architectures, prototyping and small volume fabrication. A state-of-the-art 400 m² cleanroom is operated and a range of services from consulting to prototype development is offered. In recent years, AMO has become a global player in 2D materials research for electronics and photonics.

Important Dates
  • 1 February 2022: Call open, see specifications below
  • 30 June 2022: Call closes, design freeze
  • 1 September – 31 October 2022: MPW run
  • 1300€ set price for four dies with identical design (1×1 cm²)
  • 250€ for each additional die with identical design 
  • 20% discount for customers from countries participating in the Horizon 2020 framework
  • Prices are exclusive of VAT, import duties/customs fees, withholding taxes, etc.


The offered baseline process for the first MPW run is a GFET including a top/bottom contact with an optional local or global back gate, an optional encapsulation and an optional graphene-area opening. The design of the device can be adjusted within the specifications listed below.

Technology Characteristics
Material: Silicon, Glass
Basic die size: 1 x 1 cm² (a different size can be consulted upon individual request)
General design rule: 5µm for in-layer critical dimension and over-layer alignment
Baseline Process
Top/Bottom metal contact
Wafer scale graphene transfer
Basic module provided in PDK: Hall cross, TLM devices, 4-point measurement bar
Optional: encapsulation, and via opening on top of metal pads
Optional: graphene sensing area opening
Optional: metal local or global back gate
Optional: Raman characterization
Optional: Electrical measurement for as-fabricated devices
Bio/ Gas/ Chemical sensors, Hall Sensors, Photodetectors
More details
Read more
The schematic shows the offered baseline process with top/bottom contact and local gate option.
A Hall Bar reference device with a graphene cross of 70 x 70 µm is shown on the left. On the right a graphene 4-point measurement device with a sheet size 30 x 5 µm is presented.
EUROPRACTICE and 2D-EPL webinars on Graphene