The 2D Experimental Pilot Line (2D-EPL) has launched its third multi-project wafer (MPW) run where universities, research institutes and companies can include their designs as dies on joint wafers. The 2D-EPL’s third MPW run is mainly intended towards electronics but can also include sensor devices (e.g. Hall sensor, but via opening on graphene is not in the scope of this run) and will be provided by AMO GmbH. The design of the device can be adjusted within the specifications.
The offered device structure is a GFET consisting of the following fabrication steps:
Located in Aachen, Germany, close to the borders of Belgium and the Netherlands, the research foundry AMO GmbH, a non-profit nanotechnology SME, follows the mission to efficiently close the gap between university research and industrial application. It demonstrates innovative technologies and introduces new materials, including their implementation in novel device architectures, prototyping and small volume fabrication. A state-of-the-art 400 m² cleanroom is operated and a range of services from consulting to prototype development is offered. In recent years, AMO has become a global player in 2D materials research for electronics and photonics.
Scheme with the different layers of the final GFET structure:
Technology Characteristics | |
|---|---|
Substrate | Material: Silicon Basic die size: 1 x 1 cm² |
Resolution | General design rule: 10µm for in-layer critical dimension and over-layer alignment |
Characterization | Raman characterisation Electrical measurements for as-fabricated reference devices General optical inspection of your devices |
Application | Bio/ Gas/ Chemical sensors, Hall Sensors, Photodetectors |
